| Particle Sensor KS-40A/KS-40AF (KS-40AF supports hydrofluoric acid measurements) |
| 0.1 micron, 10mL/min |
 
Optional unit: Controller KE-40 (upper left)
Syringe sampler KZ-30W1 (right) |
|
- High-output laser diode and newly developed flow cell for 0.1 micron measurement
- Repeated measurement function assures precise results also with low sample fluid quantities and short measurement time
- Compact dimensions, light weight, integrated leak sensor for easy to use
- KS-40AF employs a monolithic type sapphire cell that supports a wide range
of fluid measurement including hydrofluoric acid
|
| (KS-40A and KS-40AF are used in conjunction with the controller KE-40 or
KE-40A.) |
| Specifications |
|
KS-40A |
KS-40AF |
| Optical system |
90 degree sideway light-scattering method |
| Light source |
Laser diode (output: 200mW, wavelength: 830nm) |
| Sample object |
Chemical |
Including HF |
| Materials of parts exposed to sample fluid |
Fused silica, PFA |
Sapphire, PFA |
| Measurable particle size |
0.1 to 2 micron (with PSL particles of refractive index 1.6 in pure water) |
| Measurement size range |
Five channels (0.1, 0.15, 0.2, 0.3, 0.5micron or over) |
| Counting efficiency |
70 +/- 15% (measuring PSL particles in the range of 0.3 micron, using count
of 0.2 micron and above for comparison with reference unit) |
| Sample flow rate |
10 mL/min |
| Maximum particle concentration |
1200 particles/mL (coincidence loss 5% for 0.1 micron particles) |
| Sample fluid temperature range |
+15 to +35C (no moisture condensation on cell) |
| Allowable sample fluid pressure |
-100 to +300 kPa (gauge pressure) |
| Power supply |
Supplied via controller KE-40 or KE-40A, AC100 to 240V |
| Dimensions and weight |
Approx. 245(W) X 139(H) X 179(D) mm (max.), Approx. 4 kg |
|
|
| Particle Sensor KS-40B/KS-40BF(KS-40BF supports hydrofluoric acid measurements) |
| (KS-40B/KS-40BF is not available in U.S.) |
| 0.2 micron, 10mL/min |
 
Optional unit: Controller KE-40 (upper left)
Syringe sampler KZ-30W1 (right) |
|
- High-output laser diode and newly developed flow cell for 0.2 micron measurement
- Measurement for DI-water, solvent, photoresist, acid, and hydrofluoric
acid (KS-40BF) possible
- Repeated measurement function assures precise results also with low sample fluid quantities and short measurement time
- Compact dimensions, light weight, integrated leak sensor for easy to use
- KS-40BF employs a monolithic type sapphire cell that supports a wide range
of fluid measurement including hydrofluoric acid
|
| (KS-40B and KS-40BF are used in conjunction with the controller KE-40 or
KE-40A.) |
| Specifications |
|
KS-40B |
KS-40BF |
| Optical system |
90 degree sideway light-scattering method |
| Light source |
Laser diode (output: 50mW, wavelength: 780nm) |
| Sample object |
Chemical |
Including HF |
| Materials of parts exposed to sample fluid |
Fused silica, PFA, PTFE |
Sapphire, PFA, PTFE |
| Measurable particle size |
0.2 to 5 micron (with PSL particles of refractive index 1.6 in pure water) |
| Measurement size range |
Five channels (0.2, 0.3, 0.5, 1, 2micron or over) |
| Counting efficiency |
70 to 110% (measuring double to triple size of 0.2 micron PSL particles,
using count of 0.2 micron and above for comparison with reference unit) |
| Sample flow rate |
10 mL/min |
| Maximum particle concentration |
1200 particles/mL (coincidence loss 5% for 0.2 micron particles) |
| Sample fluid temperature range |
+15 to +35C (no moisture condensation on cell) |
| Allowable sample fluid pressure |
300 kPa or less (gauge pressure) |
| Power supply |
Supplied via controller KE-40 or KE-40A, AC100 to 240V |
| Dimensions and weight |
Approx. 245(W) X 139(H) X 179(D) mm (max.), Approx. 3.5 kg |
|
|
|
| Particle Sensor KS-41 (Monitoring Photoresist solutions) |
| 0.15 micron, 10 mL/min |
 |
For monitoring of photoresist solutions or SOG used in semiconductor production
- Detects particles in photoresist as small as 0.15 micron
- Suitable for batch, on-line, and multi-point monitoring systems
- Built-in leak detector. Leaks are indicated directly by the sensor without
time lag
- Combination with controller KE-40 and syringe sampler KZ-30W1/30W2 allows configuring a high-precision particle counter system for photoresist
|
| Specifications |
| Optical system |
90 degree sideway light scattering method |
| Light source |
Laser diode (output 200mW, wavelength 830nm) |
| Sample object |
Acid, alkaline, chemical, pure water excluding hydrofluoric |
| Materials of parts exposed to sample object |
Fused silica, PFA |
| Measurable particle size |
0.15 to 2 micron (with PSL particles of refractive index 1.6 in pure water) |
| Measurement range |
0.15, 0.20, 0.30, 0.50 micron and over (4 channels) |
| Counting efficiency |
50+/-10% (measuring PSL particles in the range of 0.3 micron, using count
of 0.2 micron and above for comparison with reference unit) |
| Sample flow rate |
10 mL/min (with PSL particles of refractive index 1.6 in pure water) |
| Max. particle concentration |
12,000 particles/ min (coincidence loss 5% for 0.15 micron particles) |
| Sample fluid temperature range |
15 to 30C (no moisture condensation on cell) |
| Allowable sample fluid pressure |
300kPa or less (Gage pressure) |
| Power supply |
Power supplied by controller KE-40 or KE-40A, 100 to 240V AC |
| Dimensions and weight |
Approx. 300(W) X 160(H) X 250(D) mm (max.), Approx. 7.5 kg |
|
|
| Controller KE-40/40A |
| Particle sensor operation and measurement data display |
 |
Serves for particle sensor operation control and measurement data display.
Allows continuous measurement in conjunction with a syringe sampler and
printer.
- For one-on-one control of particle sensor (KE-40)
- For configuration of multi-point systems with one-on-one control of particle
sensors (KE-40A)
|
| Specifications (KE-40) |
| Particle size channels |
Max. 6 channels
- When connecting to KS-40A and KS-40AF: max. 5 channels
- When connecting to KS-41: max. 4 channels
- When connecting to KS-17AF: max 2 channels
|
| Measurement time |
1 minute, 10 minutes, manual |
| Measurement modes |
HOLD: retain measurement value until start of next measurement
REPEAT: automatically restart measurement fare 10-second pause interval |
| Display |
| Numeric display: |
Particle count (max. 6 digits) |
| OVER: |
Lights up when unit is operated under interface control |
| DATA NG: |
Lights up when problem was detected during measurement |
| COUNT: |
Lights up when count exceeds 999,999 |
| REMOTE: |
Lights up when unit is operated under interface control |
|
| Interface |
Serial interface (standard) |
| Power supply |
100V to240V AC, 50/60Hz, Approx. 80VA
(Supplied power cord should be used only for connection to 100 V AC outlet.) |
| Dimensions and Weight |
Approx. 130 (H) X 240 (W) X 70 (D) mm, Approx 2.8kg |
|
| In-line Particle Sensor KS-71 |
| (KS-71 is not available in U.S.) |
| Monitoring slurry for CMP |
 |
- In semiconductor manufacturing, the trend towards higher capacity devices
with ever smaller elements continues at a rapid pace. For finishing products
which employ multi-layer wiring and embedded wiring, a technique called
chemical mechanical polishing (CMP) is widely used.
- The KS-71 is designed to monitor slurry used for CMP. It is a liquid-borne
particle sensor that can detect particles large enough to cause wafer damage.
|
| Specifications |
| Optical system |
Light extinction |
| Light source |
Laser diode |
| Materials of parts exposed to sample fluid |
Fused silica, PFA |
| Measurable particle size |
2 channels: 3 micron, 5 micron and over |
| Sample flow rate |
60 mL/min |
| Max. particle concentration |
12,000 particles/min |
| Allowable sample fluid pressure |
300kPa or less (Gage pressure) |
| Power supply |
Power supplied by external control unit |
| Dimensions and weight |
135 (W) X 97 (H) X 45 (D) mm, Approx. 400 g |
|
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